发明名称 STAGE WITH THERMAL EXPANSION COMPENSATION
摘要 PROBLEM TO BE SOLVED: To prevent the effects of heat in a reticle and a wafer chuck. SOLUTION: A chuck 110 having high specific stiffness and a high thermal conductivity compared to conventional chucks is used, and encoders 220 and 220' for measuring thermal expansion in the chuck 110 are provided. High specific stiffness provides a higher control bandwidth and improved scanning performance. Accurate measurement of the coefficient of thermal expansion and strain enables scaling factor correction or the like, thereby attaining excellent positioning accuracy. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005045215(A) 申请公布日期 2005.02.17
申请号 JP20040162319 申请日期 2004.05.31
申请人 ASML HOLDING NV 发明人 DEL PUERTO SANTIAGO E
分类号 G01B11/00;G03F7/20;H01L21/00;H01L21/027;H01L21/68;(IPC1-7):H01L21/027 主分类号 G01B11/00
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