发明名称 DEPOSITION MASK AND MANUFACTURING METHOD THEREOF, DISPLAY UNIT AND MANUFACTURING METHOD THEREOF, AND ELECTRONIC APPARATUS INCLUDING THE DISPLAY UNIT
摘要 PROBLEM TO BE SOLVED: To provide a high-precision deposition mask capable of performing vapor deposition on a large-sized deposition substrate and a method for easily manufacturing the deposition mask at a low cost, an electroluminescent display unit and a method for manufacturing the unit, and an electronic apparatus including the electroluminescent display unit. SOLUTION: The deposition mask has a configuration in which one or more mask chips 2 formed by a single crystal silicon substrate are joined with a mask support 1. The one or more mask chips 2 are joined with respective predetermined positions of the mask support 1, the orientations of the one or more mask chips 2 are joined in such a manner that the crystal orientation of the single crystal silicon substrate is aligned in a predetermined direction, and the single crystal silicon substrate of each mask chip 2 has openings. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005042133(A) 申请公布日期 2005.02.17
申请号 JP20030200064 申请日期 2003.07.22
申请人 SEIKO EPSON CORP 发明人 KUWABARA TAKAYUKI;YOTSUYA SHINICHI
分类号 H05B33/10;C23C14/04;C23C14/24;H01L27/32;H01L51/00;H01L51/50;H01L51/56;(IPC1-7):C23C14/24;H05B33/14 主分类号 H05B33/10
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