发明名称 |
DEPOSITION MASK AND MANUFACTURING METHOD THEREOF, DISPLAY UNIT AND MANUFACTURING METHOD THEREOF, AND ELECTRONIC APPARATUS INCLUDING THE DISPLAY UNIT |
摘要 |
PROBLEM TO BE SOLVED: To provide a high-precision deposition mask capable of performing vapor deposition on a large-sized deposition substrate and a method for easily manufacturing the deposition mask at a low cost, an electroluminescent display unit and a method for manufacturing the unit, and an electronic apparatus including the electroluminescent display unit. SOLUTION: The deposition mask has a configuration in which one or more mask chips 2 formed by a single crystal silicon substrate are joined with a mask support 1. The one or more mask chips 2 are joined with respective predetermined positions of the mask support 1, the orientations of the one or more mask chips 2 are joined in such a manner that the crystal orientation of the single crystal silicon substrate is aligned in a predetermined direction, and the single crystal silicon substrate of each mask chip 2 has openings. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2005042133(A) |
申请公布日期 |
2005.02.17 |
申请号 |
JP20030200064 |
申请日期 |
2003.07.22 |
申请人 |
SEIKO EPSON CORP |
发明人 |
KUWABARA TAKAYUKI;YOTSUYA SHINICHI |
分类号 |
H05B33/10;C23C14/04;C23C14/24;H01L27/32;H01L51/00;H01L51/50;H01L51/56;(IPC1-7):C23C14/24;H05B33/14 |
主分类号 |
H05B33/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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