| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive photosensitive resin precursor composition which allows alkali development excellent in shelf stability after exposure. <P>SOLUTION: The photosensitive resin precursor has (a) a polymer having a structure unit represented by the formula (1) as its main ingredient, (b) two or more photo-acid generators and (c) alkoxymethyl group containing compounds. In the formula, R<SP>1</SP>indicates an organic group from bivalent to octavalent having two or more carbon atoms; R<SP>2</SP>indicates an organic group from bivalent to hexavalent having two or more carbon atoms; R<SP>3</SP>indicates hydrogen or a 1-20C organic group; n indicates a range from 10 to 100,000; m indicates integer from 0 to 2; and p and q indicate each an integer from 0 to 4, where p+q>0. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
