RACK FOR PROCESSING PLATE SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a rack for processing a plate substrate which has a form and a material for processing the plate substrate without damaging and contaminating the substrate and without leaving an unnecessary substance in the contact part with respect to the rack on which mask blanks are vertically placed side by side in a heat treatment process and a cleaning process passing the substrate through an IPA vapor tank prior to applying a resist on a plate substrate.

SOLUTION: The rack for processing the plate substrate has a plurality of rod members made of a polyether ether ketone resin and supports a plate substrate by a groove part formed in the rod member and having at least an inclined face. The inclination angle of the inclined face in the groove is 45°at one end to be in contact with the plate substrate and is 60°to 75°in the other end.

COPYRIGHT: (C)2005,JPO&NCIPI