发明名称 Light emitting element, method of manufacturing the same, and semiconductor device having light emitting element
摘要 An InGaN active layer is formed on a sapphire substrate. A p-side electrode is formed on the InGaN active layer to supply an electric current to this InGaN active layer. The p-side electrode includes {circle over (1 an Ni layer for forming an ohmic contact with a p-GaN layer, {circle over (2 an Mo layer having a barrier function of preventing diffusion of impurities, {circle over (3 an Al layer as a high-reflection electrode, {circle over (4 a Ti layer having a barrier function, and {circle over (5 an Au layer for improving the contact with a submount on a lead frame. The p-side electrode having this five-layered structure realizes an ohmic contact and high reflectance at the same time.
申请公布号 US2005035363(A1) 申请公布日期 2005.02.17
申请号 US20040946668 申请日期 2004.09.22
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 OKAZAKI HARUHIKO;SUGAWARA HIDETO
分类号 H01L21/28;H01L33/06;H01L33/10;H01L33/32;H01L33/40;(IPC1-7):H01L33/00 主分类号 H01L21/28
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