发明名称 |
Semiconductor device and method of manufacturing semiconductor device |
摘要 |
The semiconductor device of the present invention comprises a substrate; at least one through hole formed through the substrate between front and back surfaces of the substrate; an electrical connection portion formed by a semiconductor process on at least one surface of the front and back surfaces of the substrate in a vicinity of an end opening of the through hole; an insulating layer formed of an organic material on an inside surface of the through hole; and an electroconductive layer formed on an inside surface of the insulating layer, wherein the electrical connection portion is electrically connected to the electroconductive layer to be electrically connected to a side of the other surface of the substrate.
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申请公布号 |
US6856023(B2) |
申请公布日期 |
2005.02.15 |
申请号 |
US20030347937 |
申请日期 |
2003.01.22 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
MUTA TADAYOSHI;TACHIKAWA JIN;SAITO RIICHI;SUTO TADANORI;TAKAYAMA MANABU;MORIMOTO HIROYUKI |
分类号 |
H01L23/52;H01L21/3205;H01L21/768;H01L23/48;(IPC1-7):H01L29/40 |
主分类号 |
H01L23/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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