发明名称 Semiconductor device and method of manufacturing semiconductor device
摘要 The semiconductor device of the present invention comprises a substrate; at least one through hole formed through the substrate between front and back surfaces of the substrate; an electrical connection portion formed by a semiconductor process on at least one surface of the front and back surfaces of the substrate in a vicinity of an end opening of the through hole; an insulating layer formed of an organic material on an inside surface of the through hole; and an electroconductive layer formed on an inside surface of the insulating layer, wherein the electrical connection portion is electrically connected to the electroconductive layer to be electrically connected to a side of the other surface of the substrate.
申请公布号 US6856023(B2) 申请公布日期 2005.02.15
申请号 US20030347937 申请日期 2003.01.22
申请人 CANON KABUSHIKI KAISHA 发明人 MUTA TADAYOSHI;TACHIKAWA JIN;SAITO RIICHI;SUTO TADANORI;TAKAYAMA MANABU;MORIMOTO HIROYUKI
分类号 H01L23/52;H01L21/3205;H01L21/768;H01L23/48;(IPC1-7):H01L29/40 主分类号 H01L23/52
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