发明名称 |
Method of photolithographic exposure dose control as a function of resist sensitivity |
摘要 |
A predictive method is used to compensate for intermediate batch sensitivities which inevitably occur during resist batch changeover. The compensation is applied to historical dose levels to arrive at a new dose level estimating an optimum dose. When the system discovers that a new batch of resist is loaded to a tool, historical data is used to calculate a reference dose for each tool. A batch factor is continuously calculated and using historical data along with the batch factor, a dose adjustment is made to maintain proper image size.
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申请公布号 |
US6856378(B2) |
申请公布日期 |
2005.02.15 |
申请号 |
US20030691729 |
申请日期 |
2003.10.23 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
MACHIA KEITH J.;NICHOLLS MATTHEW C.;PARRISH CHARLES J.;SCHNEIDER CRAIG E.;WHITING CHARLES A. |
分类号 |
G03B27/74;G03F7/20;(IPC1-7):G03B27/72;G03B27/80 |
主分类号 |
G03B27/74 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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