THIN FILM FORMATION METHOD BY ELECTROMAGNETIC WAVE IRRADIATION

摘要

PROBLEM TO BE SOLVED: To provide an optimum film composition and electromagnetic wave irradiation process for performing heat-treatment of a thin film by its exposure to an electromagnetic wave with a millimetric wave spectrum. SOLUTION: In a method of forming the thin film by electromagnetic wave irradiation, the thin film and a conductor layer formed therein are exposed to an electromagnetic wave with a wavelength of≥10 GHz. Here, the conductor layer has a thickness of 5-20 nm, and at least one conductor layer is formed inside the thin film or at its contact part. Self-heating of the conductor layer and exposure of the thin film to the electromagnetic wave can be simultaneously performed, so an effective heat-treatment process of the thin film by electromagnetic wave irradiation can be realized. COPYRIGHT: (C)2005,JPO&NCIPI