发明名称 METHOD AND EQUIPMENT FOR MANUFACTURING CERAMICS, AND SEMICONDUCTOR DEVICE AND PIEZOELECTRIC ELEMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a manufacturing method, in which ceramics having improved characteristics such as crystallinity can be obtained, while lowering the process temperature, and to provide ceramics manufacturing equipment. <P>SOLUTION: The method for manufacturing ceramics includes a step of depositing a ceramic film, while feeding activated species 100A to be at least one of raw materials and also feeding electromagnetic waves 200A to the prescribed region. A film, consisting of the substance to be one of the raw materials for ceramics, may be previously formed in the prescribed region. Further, the method includes a step of feeding the activated species 100A and the electromagnetic waves 200A on the first formed ceramic film 20a, to deposit a second ceramic film which is of different crystal structure from the first ceramic film 20a. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005039281(A) 申请公布日期 2005.02.10
申请号 JP20040211635 申请日期 2004.07.20
申请人 SEIKO EPSON CORP 发明人 NATORI EIJI
分类号 B41J2/16;B41J2/14;C23C16/40;H01L21/316;H01L21/8242;H01L21/8246;H01L27/105;H01L27/108;H01L41/22;H01L41/316;H01L41/317 主分类号 B41J2/16
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