| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To raise reliability of measured values by exactly detecting the dimensions of inspected pattern formed on a photo mask. <P>SOLUTION: The dimension measuring method for measuring the dimension of a pattern formed on the photo mask comprises a step S3 for obtaining an image including the pattern of the photo mask with an optical microscope, a step S5 for obtaining a simulate image by simulating the image of the optical microscope from design data corresponding to the image obtained in S3, a step S6 for comparing the image obtained in S3 and the simulate image obtained in S5 following a predetermined judgment standard, a step S7 for changing the pattern dimensions on the design data according to the judgement result of S6, and a step S8 for executing again S5 and S6 and determining the pattern dimension on the design data finally obtained as a dimensional measurement value by repeating S7 so as to filling the judgment standard in S6. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
