| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a glass substrate for an electronic device for enabling high-accuracy patterning and projection exposure, and to provide a photomask blank and a photomask using the substrate. <P>SOLUTION: The photomask blank as one kind of a glass substrate for an electronic device comprises a glass substrate 1 and a chromium film 2 having a light shielding function. The glass substrate 1 consists of a quartz glass material the principal surface and the side face of which are precisely polished. By optical inspection for defects in the glass substrate, it is found that: the substrate 1 has no defect dependent on the propagation direction of the inspection light; the substrate 1 has no stria inside; and flaws present on the substrate surface have the width (length in the direction of the minor axis) smaller than 1μm. A photomask is produced from the photomask blank, and a chromium film pattern 2' has no defect such as destructive intrusion by etching but has a desired pattern. A pattern is transferred onto an objective material by the photomask and the pattern transfer is favorably carried out. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
