发明名称 Method of controlling solder deposition utilizing two fluxes and preform
摘要 Method for controlling the deposition of solder on a base metal or substrate is disclosed. The method comprises applying an attaching flux and finishing flux to a substrate, placing a preform thereon and subjecting the same to reflow conditions. The finishing flux is applied to solubilize the normally insoluble corrosive residues that would occur when the attaching flux is subjected to reflow conditions with the preform and substrate. Alternatively, the attaching flux may be applied to the preform and substrate before undergoing reverse reflow conditions and then the finishing flux is applied to the solder deposit and substrate and the same subjected to second reflow conditions. After each method, the residues left from the attaching flux which are solubilized by the finishing flux, are cleaned by washing with a typical solvent.
申请公布号 US2005023328(A1) 申请公布日期 2005.02.03
申请号 US20040934152 申请日期 2004.09.03
申请人 STIPP JOHN N.;DERAM BRIAN T. 发明人 STIPP JOHN N.;DERAM BRIAN T.
分类号 B23K1/00;B23K1/008;B23K1/20;B23K35/26;B23K35/36;H05K3/26;H05K3/34;(IPC1-7):B23K31/02 主分类号 B23K1/00
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