LIGHT CONDENSING OPTICAL SYSTEM, LIGHT SOURCE UNIT, LIGHTING OPTICAL APPARATUS, AND ALIGNER

摘要

PROBLEM TO BE SOLVED: To provide an exposure apparatus which can faithfully transfer a mask pattern to a photosensitive substrate surface with higher throughput by using a light source unit which can collect the light beam without absorption by plasma of the EUV light beam reflected by an auxiliary light condensing mirror. SOLUTION: The light source unit of the EUV light beam is provided with a plasma light source for radiating the EUV light beam, a light condensing mirror having the rotating elliptical surface as the reflecting surface in which the plasma light source is located at a first focal point thereof, and an auxiliary condensing mirror having the spherical surface as the reflecting surface in which spherical center is allocated with a certain deviation from the location of the plasma light source. COPYRIGHT: (C)2005,JPO&NCIPI