发明名称 Verfahren zum Ablösen einer Epitaxieschicht oder eines Schichtsystems und nachfolgendem Aufbringen auf einen alternativen Träger
摘要 A method for removing layers or layer systems from a substrate and subsequent application onto an alternative substrate. A porous breakaway layer is formed by anodization in hydrofluoric acid. Optionally, a stabilizing layer with lower porosity is previously produced on top of the breakaway layer. The oxide of the porous breakaway layer or the stabilizing layer is removed by brief contact with HF, and an epitaxial layer is applied on the porous breakaway layer or the stabilizing layer. The epitaxial layer or the layer system is then removed from the substrate, and the epitaxial layer or the layer system is applied onto an alternative substrate. Optionally, the stabilizing layer and/or residues of the breakaway layer are removed from the epitaxial layer.
申请公布号 DE19803013(B4) 申请公布日期 2005.02.03
申请号 DE1998103013 申请日期 1998.01.27
申请人 ROBERT BOSCH GMBH 发明人 LAERMER, FRANZ;FREY, WILHELM;ARTMANN, HANS
分类号 H01L21/306;H01L21/20;H01L21/3063;H01L21/78;(IPC1-7):H01L21/306;H01L21/311;H01L21/58 主分类号 H01L21/306
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