| 摘要 |
PURPOSE: A semiconductor fabrication system for performing a dry-etch process is provided to generate plasma of high uniformity by arranging uniformly induction coils for generating the magnetic field. CONSTITUTION: A semiconductor fabrication system for performing a dry-etch process includes a reaction chamber(10), a power application unit(13), a gas supply unit(40), a plasma generation unit(20), and a power supply unit(30). The reaction chamber(10) includes a substrate supporter(11) for supporting a semiconductor substrate(100). The power application unit(13) applies AC power to the reaction chamber. The gas supply unit(40) supplies the processing gas to the inside of the reaction chamber. The plasma generation unit(20) includes one or more center induction coils and a plurality of peripheral coils. The center induction coils are arranged at an upper side of the outside of the reaction chamber. The peripheral coils are arranged around the center induction coils. The power supply unit(30) supplies the AC power to the center induction coils and the peripheral coils.
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