DIFFRACTIVE OPTICAL ELEMENT CAPABLE OF IMPROVING PROCESS LATITUDE OF EXPOSURE APPARATUS AND ILLUMINATION SYSTEM HAVING THE SAME AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING DIFFRACTIVE OPTICAL ELEMENT

摘要

PURPOSE: A diffractive optical element and an illumination system having the same and a method for manufacturing a semiconductor device using the diffractive optical element are provided to improve a process latitude of an exposure apparatus by varying size and position of poles according to an illumination condition. CONSTITUTION: A diffractive optical element(10) provides a multiple illumination shape. The diffractive optical element includes a prominence and depression surface(13) to form an illumination shape having a component in a circumference direction as a function of a radius and an angle of the illumination shape. The diffractive optical element provides different illumination shapes according to a range in a radius direction of the illumination shape.