发明名称 RESIDUAL GAS ANALYZING APPARATUS OF SEMICONDUCTOR MANUFACTURING EQUIPMENT FOR REMOVING UNNECESSARY MAN-HOUR LOSS AND PROLONGING LIFETIME OF HEATER FILAMENT
摘要 PURPOSE: A residual gas analyzing apparatus of semiconductor manufacturing equipment is provided to suppress an unnecessary man-hour loss and to prolong the lifetime of a heater filament by driving a heater of the residual gas analyzing apparatus interdependent on a heater driving signal of a process chamber. CONSTITUTION: A residual gas analyzing apparatus includes a heater and relay. The heater(92) includes a filament. The relay is used for supplying selectively power supply to the heater according to a heater on/off signal of a process chamber. The relay supplies power supply to the heater in a heater on signal state of the process chamber.
申请公布号 KR20050011377(A) 申请公布日期 2005.01.29
申请号 KR20030050460 申请日期 2003.07.23
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, SEON WOO
分类号 H01L21/205;C23C16/52;G01M3/04;H01J49/04;(IPC1-7):H01L21/205 主分类号 H01L21/205
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