发明名称 |
Method for forming bump protective collars on a bumped wafer |
摘要 |
A method of forming bump protective collars is disclosed. A wafer has an active surface with a plurality of bonding pads and a passivation layer. A plurality of reflowed bumps are formed over the bonding pads. A photoresist is coated on the active surface. Using the reflowed bumps as a photo mask, the photoresist is exposed and developed. After removing the photoresist, a plurality of bump protective collars are formed on the passivation layer and around the reflowed bumps for improving the reliability of the reflowed bumps. |
申请公布号 |
US2005020051(A1) |
申请公布日期 |
2005.01.27 |
申请号 |
US20040895060 |
申请日期 |
2004.07.21 |
申请人 |
ADVANCED SEMICONDUCTOR ENGINEERING, INC. |
发明人 |
TSAI CHI-LONG |
分类号 |
H01L21/60;H01L23/485;(IPC1-7):H01L21/44;H01L23/48 |
主分类号 |
H01L21/60 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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