| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for rotary coating that can form a uniform and thick film by rotary coating of viscous coating liquid on a substrate and a method for manufacturing a semiconductor device using it. SOLUTION: While rotating a rotary chuck 3 at low speed, a coating fluid 2 is discharged from a coating fluid discharge nozzle 4 located so that the centerline 12 of the coating fluid discharge nozzle 4 deviates from the centerline 11 of a semiconductor wafer 1 (Fig. (a) ). Discharge of the coating fluid 2 is continued until the coating fluid 2 spreads in an approximately circular shape and reaches to the center of the semiconductor wafer 1 (Fig. (b) ). After stopping discharge, the surplus coating fluid 2 is scattered by rotating the rotary chuck 3 at high speed (Fig. (c) ) and thus a film 6 is formed (Fig. (d) ). Shifting a discharge point prevents the coating fluid 2 from accumulating and rotation at high speed B after that forms the uniform and thick film 6. COPYRIGHT: (C)2005,JPO&NCIPI
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