METHOD AND APPARATUS FOR INSPECTING PHOSPHORE

摘要

PROBLEM TO BE SOLVED: To solve the problem that it has not been possible to appropriately inspect application unevenness of phosphor stripes due to the occurrence of moire phenomena caused by the effects of non-light-emitting parts of phosphors applied in a stripe shape and a illumination unevenness of ultraviolet illumination used for making the phosphor stripes emit light in inspection on application unevenness of the phosphor stripes applied to a glass substrate of a plasma display etc. SOLUTION: Electromagnetic waves or particle beams are irradiated to a plurality of the phosphors formed in the substrate and arranged at approximately regular intervals. Light emitted from the phosphors is imaged. The signal level of the imaged image is detected to compute an average value of a part corresponding to a signal level of a signal level prescribed value or higher. Based on the computed average value, application unevenness of the phosphors are detected. COPYRIGHT: (C)2005,JPO&NCIPI