发明名称 Low-pressure axial direction excitation type f2 laser oscillator
摘要 An axial direction excitation type F2 laser apparatus (11) comprising a discharge tube (1) consisting of an insulating cylinder and metal electrodes (2, 3) at both ends of thereof, and a reflecting mirror or a transmitting mirror constituting a resonator outside the electrodes. A high voltage for pulse discharge is applied to the discharge electrodes (2, 3) from a drive circuit. The total gas pressure in the discharge tube (1) is set in a range between 10 Torr. and 100 Torr., the concentration of F2 gas to the total gas is set to be in a range between 0.2% and 2.0%. The low-pressure axial direction excitation type F2 laser apparatus having small size high efficiency can be provided at a low cost.
申请公布号 US2005018735(A1) 申请公布日期 2005.01.27
申请号 US20040489103 申请日期 2004.08.31
申请人 JITSUNO TAKAHISA 发明人 JITSUNO TAKAHISA
分类号 H01S3/0971;H01S3/03;H01S3/036;H01S3/038;H01S3/223;(IPC1-7):H01S3/22 主分类号 H01S3/0971
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