| 发明名称 |
Method for manufacturing thin film transistor array panel |
| 摘要 |
The present invention relates to a method of manufacturing a thin film transistor array panel and apparatus and more particularly to an apparatus containing an in-situ fluorine generation chamber.
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| 申请公布号 |
US2005019969(A1) |
申请公布日期 |
2005.01.27 |
| 申请号 |
US20040867811 |
申请日期 |
2004.06.16 |
| 申请人 |
CHANG WON-KIE;LEE JIN-WOOK;SONG WON;YOO JEONG-SIK;KIM YOU-KEUN;CHOI DONG-UK |
发明人 |
CHANG WON-KIE;LEE JIN-WOOK;SONG WON;YOO JEONG-SIK;KIM YOU-KEUN;CHOI DONG-UK |
| 分类号 |
G02F1/1368;B08B7/00;C23C16/44;G02F1/136;H01L21/205;H01L21/3065;H01L21/336;H01L21/77;H01L21/84;H01L27/12;H01L29/786;(IPC1-7):H01L21/84 |
主分类号 |
G02F1/1368 |
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