| 摘要 |
PROBLEM TO BE SOLVED: To provide an electrooptical constant measurement method and an electrooptical constant measuring apparatus that are effective for evaluating the level of the electrooptical effect of a thin film required for designing an optical waveguide incorporating an electrooptical thin film, and designing a functional optical component. SOLUTION: The electrooptical constant measuring apparatus comprises pieces of measuring apparatus 10, 20 for measuring (tanΨ, cosΔ) spectrum by a spectrum ellipsometric method while voltage can be applied between a substrate and a transparent conductive thin film by covering the electrooptical thin film formed on the substrate with the transparent conductive thin film; and an arithmetic unit 30 for comparing the amplitude of the differential spectrum between two tanΨspectra with the amplitude of a reference spectrum obtained by differentiating the tanΨspectra from the tanΨspectra when voltage is applied and is not applied, obtained by the pieces of measuring apparatus 10, 20, hence calculating the effective wavelength change of optical interference resulting from the application of voltage, deriving a refractive index change from the value, and calculating an electrooptical constant. COPYRIGHT: (C)2005,JPO&NCIPI
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