发明名称 STENCIL MASK HAVING MAIN STRUT AND AUXILIARY STRUT AND MANUFACTURING METHOD OF THE SAME
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a stencil mask having main struts and auxiliary struts and a manufacturing method of the same. <P>SOLUTION: The stencil mask includes a membrane forming thin film having a membrane region and boundary regions that define the membrane region. The membrane region has two or more pattern regions in which openings to allow charged particle beams to transmit are formed and non-pattern regions located therebetween. At the boundary regions of the membrane forming thin film, the main struts are formed to support the membrane region. At the non-pattern regions in the membrane region, the auxiliary struts are formed to divide the membrane region into two or more divided membrane regions. Each of the divided membrane regions is supported by the auxiliary strut. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP2005020014(A) 申请公布日期 2005.01.20
申请号 JP20040190389 申请日期 2004.06.28
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 KIM IN-SUNG;KIM HO-CHUL
分类号 G03F1/20;G03F9/00;H01L21/00;H01L21/027;(IPC1-7):H01L21/027;G03F1/16 主分类号 G03F1/20
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