发明名称 Method for inspecting semiconductor device
摘要 A wafer is irradiated with laser light having a wavelength which is transmitted through an inside of a crystal of the wafer and does not generate electromotive force due to photo-excitation while the laser light is scanned. When a temperature of the wafer is increased by the irradiation, thermo-electromotive force is generated in a crystalline abnormal part of the wafer by Seebeck effect. A defect inside the crystal is detected such that the thermo-electromotive force is detected by a change in voltage or current which appears between an anode and a cathode of the wafer and the thermo-electromotive force is displayed on CRT.
申请公布号 US2005012923(A1) 申请公布日期 2005.01.20
申请号 US20040879060 申请日期 2004.06.30
申请人 CANON KABUSHIKI KAISHA 发明人 SHIBA SHIGEMITSU
分类号 H01L21/66;G01R31/311;(IPC1-7):G01N21/00 主分类号 H01L21/66
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