发明名称 MASK PREPARING METHOD AND MASK PREPARING APPARATUS
摘要 <p><P>PROBLEM TO BE SOLVED: To reduce pattern drawing time for all of master masks in the process of preparing a mask from a plurality of the master masks. <P>SOLUTION: When the patterns of the master masks are individually drawn, the patterns are simultaneously drawn in parallel by using a plurality of pattern projection apparatuses 10a, 10b, 10c. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP2005010430(A) 申请公布日期 2005.01.13
申请号 JP20030174017 申请日期 2003.06.18
申请人 OMI TADAHIRO;BALL SEMICONDUCTOR INC 发明人 OMI TADAHIRO;SUGAWA SHIGETOSHI;TAKEHISA KIWAMU
分类号 G03F1/76;G03F7/20;H01L21/027;(IPC1-7):G03F1/08 主分类号 G03F1/76
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