发明名称 |
MASK PREPARING METHOD AND MASK PREPARING APPARATUS |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To reduce pattern drawing time for all of master masks in the process of preparing a mask from a plurality of the master masks. <P>SOLUTION: When the patterns of the master masks are individually drawn, the patterns are simultaneously drawn in parallel by using a plurality of pattern projection apparatuses 10a, 10b, 10c. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
申请公布号 |
JP2005010430(A) |
申请公布日期 |
2005.01.13 |
申请号 |
JP20030174017 |
申请日期 |
2003.06.18 |
申请人 |
OMI TADAHIRO;BALL SEMICONDUCTOR INC |
发明人 |
OMI TADAHIRO;SUGAWA SHIGETOSHI;TAKEHISA KIWAMU |
分类号 |
G03F1/76;G03F7/20;H01L21/027;(IPC1-7):G03F1/08 |
主分类号 |
G03F1/76 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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