发明名称 |
Apparatus and method to deposit magnesium oxide film on a large area |
摘要 |
An apparatus and method to deposit a MgO film on a large substrate area. The method includes applying a voltage to one or more magnesium targets; applying an electric current to the one or more magnesium targets when the voltage stops increasing so that a power with a negative square wave, which does not cause mutual interfere, is applied to the one or more magnesium targets; and forming a MgO film on a substrate using magnesium particles emitted from the one or more magnesium targets by the power applied. The disclosed apparatus to deposit a MgO film on a large substrate area includes a magnetron part having at least one magnesium target and a permanent magnet; a power control part to apply power to the at least one magnesium target and separately provide control for each of the at least one magnesium target; a flow control part to supply gases for the at least one magnesium target; a substrate control part to control a substrate; a vacuum control part to control a vacuum state in a chamber; and a heater control part to maintain temperature in the chamber.
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申请公布号 |
US2005006225(A1) |
申请公布日期 |
2005.01.13 |
申请号 |
US20040811946 |
申请日期 |
2004.03.30 |
申请人 |
CHOI YOUNG WOOK;KIM JEE HYUN |
发明人 |
CHOI YOUNG WOOK;KIM JEE HYUN |
分类号 |
C23C14/08;C23C14/35;(IPC1-7):B05D5/12;C23C14/00 |
主分类号 |
C23C14/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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