APPARATUS FOR SUPPLYING DEPOSITION SOURCE TO DEPOSITION EQUIPMENT TO AVOID STOPPING DEPOSITION EQUIPMENT DUE TO REPLACEMENT OF SOURCE STORING RECEPTACLE

摘要

PURPOSE: An apparatus for supplying a deposition source to deposition equipment is provided to avoid stopping deposition equipment due to replacement of a source storage receptacle by continuously supplying a new source without stopping the supply of a source to a process chamber of deposition equipment like CVD(chemical vapor deposition) equipment. CONSTITUTION: A source to be supplied to deposition equipment is stored in the first storage receptacle(110). When the source stored in the first storage receptacle is consumed, the second storage receptacle(150) stores the source to be continuously supplied to the deposition equipment instead of the first storage receptacle. A source transfer pipe(351,355) alternatively supplies the source from the first and second storage receptacles to the deposition equipment.