发明名称 CARRYING MEMBER WITH CLEANING FUNCTION AND CLEANING METHOD FOR SUBSTRATE PROCESSING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a carrying member with cleaning function with which vacuum down in a device caused by the carrying member is hard to be caused, and removal operation for an foreign object is easily and surely performed, when the carrying member is carried into a substrate processing device for cleaning removal for the foreign object in the device. SOLUTION: In the carrying member with cleaning function in which a cleaning layer is provided at least on a single surface of the carrying member, when the member is thrown in a chamber whose degree of vacuum is 3×10<SP>-10</SP>torr and temperature is 50°C, a time for recovering the degree of vacuum, temporarily came down, to 1×10<SP>-9</SP>torr is within 100 minutes after throwing in. Especially, the carrying member with cleaning function having the constitution in which the cleaning layer has no adhesive force substantially, or the carrying member with cleaning function having a constitution in which the cleaning layer comprises heat-resisting polymer resin is provided. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005005670(A) 申请公布日期 2005.01.06
申请号 JP20040019523 申请日期 2004.01.28
申请人 NITTO DENKO CORP 发明人 TERADA YOSHIO;NAMIKAWA AKIRA;UENDA DAISUKE;FUNATSU ASAMI
分类号 H01L21/677;B08B1/00;B08B7/00;H01L21/304;H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/677
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