| 摘要 |
PURPOSE: An examination device of a photomask is provided, to allow the pattern face on a mask to be loaded vertically, thereby minimizing the particle falling on the pattern face. CONSTITUTION: The examination device of a photomask comprises a stage which loads a photomask(24) to be examined to the vertical direction; a dichromic mirror(26, 28) which changes the direction of the laser exited from a laser diode to allow the laser to be irradiated onto the photomask through an object lens(25); a vibration lens(27) which changes the propagation direction of the laser having the information of a pattern examination read at the photomask; and a photoelectric conversion device which converts the light having the information of a pattern examination passed through the vibration lens into an electrical signal. Preferably the mask is loaded by adhering a mask to a stage panel, and the stage fixes the mask by vacuum and a finger.
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