| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma processing apparatus capable of suppressing the leakage of electromagnetic waves from inner space in which plasma processing is performed and stably carrying an object to be processed in the inner space. <P>SOLUTION: The plasma processing apparatus 1 generates plasma under atmospheric pressure to process a glass substrate 12. The plasma processing apparatus 1 is provided with a grounded conductive container 10 which regulates the inner space 4 for performing plasma processing. The container 10 includes aperture parts 8 through which the glass substrate 12 to be carried between the inner space 4 and the external is passed and extending parts 9 connected to peripheries of aperture parts 8 and extended so as to be projected to the external. The plasma processing apparatus 1 is also provided with rotating rollers 7 arranged in the extending parts 9 to carry the glass substrate 12. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
