发明名称 APPARATUS AND METHOD OF TREATING EXHAUST GAS
摘要 <p>An exhaust gas treating apparatus (1) has a case body (2) and plasma producing means (3) that is capable of producing plasma inside the case body (2) and treats substances contained in an exhaust gas by the plasma. The plasma producing means (3) has one or more each of a pulse electrode (4) and a ground electrode (5) that are opposedly arranged in the case body (2) and has a pulse power source (6) capable of feeding a pulse current to the pulse electrode (4) while switching frequency and/or voltage for different values at predetermined time intervals. Frequency and/or voltage is switched for different values at predetermined time intervals, so that plasma of a kind adequate for substances contained in an exhaust gas is produced between the pulse electrode (4) and the ground electrode (5). As a result, the substances to be treated in the exhaust gas can be selectively treated.</p>
申请公布号 WO2005000450(A1) 申请公布日期 2005.01.06
申请号 WO2004JP09016 申请日期 2004.06.25
申请人 NGK INSULATORS, LTD.;HONDA MOTOR CO., LTD.;MIYAIRI, YUKIO;FUJIOKA, YASUMASA;MASUDA, MASAAKI;HATANO, TATSUHIKO;SAKUMA, TAKESHI;IMANISHI, YUUICHIRO;IWAMA, KEIZO;DOSAKA, KENJI 发明人 MIYAIRI, YUKIO;FUJIOKA, YASUMASA;MASUDA, MASAAKI;HATANO, TATSUHIKO;SAKUMA, TAKESHI;IMANISHI, YUUICHIRO;IWAMA, KEIZO;DOSAKA, KENJI
分类号 B01D53/32;B01D53/92;B01J19/08;F01N3/08;(IPC1-7):B01D53/56;B01D53/94;B01D53/72 主分类号 B01D53/32
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