发明名称 |
Vacuum deposition device for coating substrates by PVD comprises a process chamber containing a first process station, an inlet, an outlet and a vacuum robot formed as a drive unit for moving a substrate arranged in the process chamber |
摘要 |
<p>Vacuum deposition device comprises a first process chamber (1) containing a first process station, an inlet, an outlet and a vacuum robot (5) formed as a drive unit for moving a substrate arranged in the first process chamber.</p> |
申请公布号 |
DE10323295(A1) |
申请公布日期 |
2005.01.05 |
申请号 |
DE2003123295 |
申请日期 |
2003.05.21 |
申请人 |
VON ARDENNE ANLAGENTECHNIK GMBH |
发明人 |
HEISIG, ANDREAS;GODER, REINHARD |
分类号 |
C23C14/56;(IPC1-7):C23C14/56 |
主分类号 |
C23C14/56 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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