发明名称 Apparatus for and method of continuous HTS tape buffer layer deposition using large scale ion beam assisted deposition
摘要 The present invention is a high-throughput ion beam assisted deposition (IBAD) system and method of utilizing such a system that enables continuous deposition of thin films such as the buffer layers of HTS tapes. The present invention includes a spool-to-spool feed system that translates a metal substrate tape through the IBAD system as the desired buffer layers are deposited atop the translating substrate tape using an e-beam evaporator assisted by an ion beam. The system further includes a control and monitor system to monitor and regulate all necessary system parameters. The present invention facilitates deposition of a high-quality film over a large area of translating substrate.
申请公布号 US2004261708(A1) 申请公布日期 2004.12.30
申请号 US20030609250 申请日期 2003.06.26
申请人 SELVAMANICKAM VENKAT;SATHIRAJU SRINIVAS 发明人 SELVAMANICKAM VENKAT;SATHIRAJU SRINIVAS
分类号 C23C14/08;C23C14/54;C23C14/56;(IPC1-7):C23C16/00 主分类号 C23C14/08
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