发明名称 |
Apparatus for and method of continuous HTS tape buffer layer deposition using large scale ion beam assisted deposition |
摘要 |
The present invention is a high-throughput ion beam assisted deposition (IBAD) system and method of utilizing such a system that enables continuous deposition of thin films such as the buffer layers of HTS tapes. The present invention includes a spool-to-spool feed system that translates a metal substrate tape through the IBAD system as the desired buffer layers are deposited atop the translating substrate tape using an e-beam evaporator assisted by an ion beam. The system further includes a control and monitor system to monitor and regulate all necessary system parameters. The present invention facilitates deposition of a high-quality film over a large area of translating substrate.
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申请公布号 |
US2004261708(A1) |
申请公布日期 |
2004.12.30 |
申请号 |
US20030609250 |
申请日期 |
2003.06.26 |
申请人 |
SELVAMANICKAM VENKAT;SATHIRAJU SRINIVAS |
发明人 |
SELVAMANICKAM VENKAT;SATHIRAJU SRINIVAS |
分类号 |
C23C14/08;C23C14/54;C23C14/56;(IPC1-7):C23C16/00 |
主分类号 |
C23C14/08 |
代理机构 |
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地址 |
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