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发明名称
Immersion photolithography system and method using inverted wafer-projection optics interface
摘要
申请公布号
US2004263808(A1)
申请公布日期
2004.12.30
申请号
US20040831300
申请日期
2004.04.26
申请人
ASML HOLDING NV
发明人
SEWELL HARRY
分类号
G02B13/14;G03B27/42;G03F7/20;H01L21/027;(IPC1-7):G03B27/52
主分类号
G02B13/14
代理机构
代理人
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