发明名称 |
Unsaturated monomers, polymers, chemically amplified resist composition, and process of pattern formation |
摘要 |
There is provided a chemically-amplified resist composition having high transparency to light having a wavelength of 220 nanometers or smaller, excellent resistance to etching, and excellent adhesion to a substrate. The chemically-amplified resist composition is prepared through the use of at least one of a repeated structural unit having a bridged alicyclic gamma-lactone structure defined in the general formula (III), a repeated structural unit having a bridged alicyclic gamma-lactone structure defined in the general formula (IV), and a repeated structural unit having a bridged alicyclic gamma-lactone structure defined in the general formula (V).
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申请公布号 |
US2004265732(A1) |
申请公布日期 |
2004.12.30 |
申请号 |
US20040497302 |
申请日期 |
2004.06.01 |
申请人 |
MAEDA KATSUMI;NAKANO KAICHIRO |
发明人 |
MAEDA KATSUMI;NAKANO KAICHIRO |
分类号 |
C07D307/92;C07D307/93;C07D493/22;C08F20/28;C08F32/08;C08G61/08;C08G61/12;G03F7/039;H01L21/027;(IPC1-7):G03C1/76;G03C1/492 |
主分类号 |
C07D307/92 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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