Lithographic apparatus and device manufacturing method

摘要

The apparatus has a radiation system to provide a projection beam of radiation. A high precision liquid supply system (18) supplies a liquid between a projection system (PL) and a substrate (W). The system (18) is arranged such that a space between the liquid and the substrate is not occupied by the liquid with a high refractive index. A surface of the liquid closest to the substrate is parallel to the substrate. An independent claim is also included for a device manufacturing method.