| 发明名称 |
Plasma-resistant member and plasma treatment apparatus using the same |
| 摘要 |
A plasma-resistant member used in a reaction chamber of a plasma treating apparatus is formed of a dense alumina sintered product having an average grain size of 18-45 mum, a surface roughness Ra of 0.8-3.0 mum and a bulk density of 3.90 g/cm<3 >or over.
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| 申请公布号 |
US6834613(B1) |
申请公布日期 |
2004.12.28 |
| 申请号 |
US20000719010 |
申请日期 |
2000.12.07 |
| 申请人 |
TOSHIBA CERAMICS CO., LTD.;TOKYO ELECTRON LIMITED |
发明人 |
MIYAZAKI AKIRA;MORITA KEIJI;NAGASAKA SACHIYUKI;MORIYA SHUJI |
| 分类号 |
H05H1/46;B01J19/00;B01J19/08;C04B35/10;C04B35/111;H01J37/32;H01L21/00;H01L21/302;H01L21/3065;(IPC1-7):H01L21/00 |
主分类号 |
H05H1/46 |
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