| 摘要 |
An apparatus for depositing films on a substrate, the apparatus including: a plasma deposition chamber having a first electrode and a second electrode that defines a target plane in which the substrate is held during deposition, and wherein during deposition a plasma is sustained between the first and second electrodes, said deposition chamber also including an input window and an output window; and a monitoring system which includes a light source and an optical detector, both located outside of the deposition chamber, said optical monitoring system also including an optical system that directs a beam from the light source through the input window and into the deposition chamber as a measurement beam, wherein the measurement beam arrives at the target plane along a path that is approximately normal to the target plane and wherein during operation said measurement beam interacts with the substrate to generate a return measurement beam that passes from the substrate out of the chamber through the output window, wherein said optical system directs the measurement return beam onto the optical detector.
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