COATING APPARATUS WITH A COATING SOLUTION SUPPLY ARM PARALLEL TO THE PLANE OF A SUBSTRATE

摘要

PURPOSE: A coating apparatus is provided to a coating solution supply arm parallel to the plane of a substrate, thereby form a coating layer having an uniform thickness on the substrate by using a balance poise for poising the coating solution supply arm. CONSTITUTION: A coating apparatus comprises a substrate support unit(1), a coating solution supply unit, and a balance poise(6). The coating solution supply unit includes a coating solution supply arm(3) and a support frame(4) for supporting the coating solution supply arm, wherein the coating solution supply arm is extended to be parallel to the plane of a substrate. The coating solution supply arm has a supply nozzle(31) distant from the plane of the substrate. The balance poise is installed at the support frame, wherein the balance poise is disposed in the opposite direction of the extension direction of the coating solution supply arm.