| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma treatment device capable of uniformly executing a processing to the outer peripheral part side of an object to be processed. SOLUTION: The plasma treatment device is provided with a container whose inner side is evacuated, a sample base arranged on the inner side of the container, on which a sample is to be mounted, an antenna arranged above the sample base for radiating an electric field to the inner side of the container, a power source for supplying a high frequency to the sample base, and a cover arranged covering the sample base, arranged on the outer peripheral side of the sample through a gap with the outer peripheral end of the sample and constituted of an insulating member. The plasma treatment device is provided with a projection part arranged on the cover and provided with a corner part positioned above the outer peripheral end of the sample more on the outer peripheral side than the outer peripheral end of the sample. COPYRIGHT: (C)2005,JPO&NCIPI
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