发明名称 |
Method and apparatus for automated, in situ material detection using filtered fluoresced, reflected, or absorbed light |
摘要 |
A method and apparatus for detection of a particular material, such as photo-resist material, on a sample surface. A narrow beam of light is projected onto the sample surface and the fluoresced and/or reflected light intensity at a particular wavelength band is measured by a light detector. The light intensity is converted to a numerical value and transmitted electronically to a logic circuit, which determines the proper disposition of the sample. The logic circuit controls a sample-handling robotic device which sequentially transfers samples to and from a stage for testing and subsequent disposition. The method is particularly useful for detecting photo-resist material on the surface of a semiconductor wafer.
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申请公布号 |
US6831734(B2) |
申请公布日期 |
2004.12.14 |
申请号 |
US20020093350 |
申请日期 |
2002.03.07 |
申请人 |
MICRON TECHNOLOGY, INC. |
发明人 |
EYOLFSOU MARK;HOCHHALTER ELTON J.;PHILLIPS JOE LEE;JOHNSON DAVID R.;FRANK PETER S. |
分类号 |
G01N21/47;G01N21/64;G01N21/88;(IPC1-7):G01N21/64 |
主分类号 |
G01N21/47 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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