发明名称 SYSTEM FOR MEASURING BEAM POSITION
摘要 PROBLEM TO BE SOLVED: To provide a system for measuring beam position capable of acquiring uniform gains, without causing differences in the temperature among amplifiers, that for amplifying the right-side electrode signal and that for amplifying the left-side electrode signal. SOLUTION: The system comprises an electrostatic beam position monitor 1, where at least two electrodes, a right side electrode 2 and a left side electrode 3, are provided in a vacuum vessel, a plurality of amplification circuits for separately amplifying the output voltage from the right-side electrode of the electrostatic beam position monitor and that from the left-side electrode, and a beam position signal processing circuit 6 that receives the outputs from the plurality of amplification circuits for calculating beam position. Each electrode of the electrostatic beam position monitor is constituted of electrode plates 7 insulated from each other and an earth plate 8, forming an electrostatic capacitance between the electrode plate and the earth plate. A variable capacitance capacitor 33 is connected in parallel to the electrostatic capacity. The electrostatic capacity of the variable capacitance capacitor is made changeable by the operation from the outside of the vacuum vessel. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004347607(A) 申请公布日期 2004.12.09
申请号 JP20040206806 申请日期 2004.07.14
申请人 MITSUBISHI ELECTRIC CORP 发明人 YAMAMOTO YUICHI;ISHI SADAHIRO;MATSUI SHIGEAKI
分类号 G21K5/04;G01T1/29;H05H13/04;(IPC1-7):G01T1/29 主分类号 G21K5/04
代理机构 代理人
主权项
地址