发明名称 Defect detection system
摘要 A defect detection system to check any defect in the pattern to be checked by comparing a pattern to be checked with a reference pattern includes an edge detection means for detecting a pattern edge of the pattern to be checked by scanning a substrate by laser beams and detecting reflected light thereof. After the relative position between the substrate and the imaging means is adjusted so that the pattern edge of the pattern to be checked is substantially aligned with one side of CCD pixels, an image of the pattern to be checked is picked up. Therefore, the defect detection system corrects misalignment less than one pixel between a pattern to be checked and a reference pattern to prevent occurrence of a false defect.
申请公布号 US6829047(B2) 申请公布日期 2004.12.07
申请号 US20020061235 申请日期 2002.02.04
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 FUJII TATSUYA;ONOYAMA AYUMU;SAKURAI KOICHI
分类号 G01B11/00;G01B11/30;G01N21/95;G01N21/956;H01L21/66;(IPC1-7):G01N21/00 主分类号 G01B11/00
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