发明名称 |
LITHOGRAPHIC PROJECTION APPARATUS WITH CONDENSER INCLUDING CONCAVE FACE AND CONVEX FACE |
摘要 |
PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus in which an ML condenser has been substituted by a condenser that can form a radiation beam by collecting a radiated light within a solid angle which is equivalent to the solid angle within which the ML condenser collects the radiated light. SOLUTION: The lithographic apparatus to be disclosed includes a radiation source that emits the radiated light and at least one condenser (59; 63; 73) that collects the radiated light by being arranged close to the radiation source (51) and forms a radiated beam (52). The at least one condenser includes a first reflector on a concave-face mirror (53) and a second reflector on a convex-face mirror (55). The concave-face mirror (53) is arranged surrounding the convex-face mirror (55). The first reflector on the concave-face mirror (53) receives the radiated light from the radiation source (51). The first reflector reflects the received radiated light toward the second reflector on the convex-face mirror (55) to form a beam of the radiated light (52). COPYRIGHT: (C)2005,JPO&NCIPI |
申请公布号 |
JP2004343082(A) |
申请公布日期 |
2004.12.02 |
申请号 |
JP20040105027 |
申请日期 |
2004.03.31 |
申请人 |
ASML NETHERLANDS BV |
发明人 |
BANINE VADIM YEVGENYEVICH |
分类号 |
G02B17/06;G03F7/20;H01L21/027;(IPC1-7):H01L21/027 |
主分类号 |
G02B17/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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