FINE STRUCTURE AND METHOD FOR PREPARATION THEREOF

摘要

A method for preparing a fine structure, wherein a laminated structure having two or more of metal and inorganic oxide layers is subjected to reactive ion etching, the surface of a film composed of the oxide or a laminate of the oxide and the metal is activated to effect a chemical reaction, and a fine structure having a hollow portion is formed on a substrate through the deposition of the product of the reaction.