| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To prevent the re-adhesion of a foreign substance on a proximity-field light aligner, and to enable a fine working. <P>SOLUTION: Each washing unit for a mask carrying hand, a mask chuck, a mask and a wafer-carrying hand wafer chuck is installed in the aligner, and the removal of the foreign substances is carried out in a regular sequence regarding these washing units. A foreign-substance inspection removing process for the mask is conducted before a carrying to the mask chuck of the mask, the foreign-substance inspection removing process for the carrying hand is conducted before a mask carrying operation, the foreign-substance inspection removing process for the mask chuck is carried out, and the foreign-substance inspection removing process for a section fast stuck on the wafer of the mask is conducted before a close-adhesion exposure regarding the mask side in the order of the processes. Then, the foreign-substance inspection removing process for the wafer carrying hand is conducted before the wafer is carried to the chuck on the wafer side, and the foreign-substance inspection removing process for the chuck is conducted before a wafer setting. The process on the wafer side is conducted after the process on the mask side in a series of the processes. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
