发明名称 Semiconductor device and method of manufacturing semiconductor device
摘要 Disclosed is a method of manufacturing a semiconductor device, comprising preparing a first substrate including an integrated circuit chip, first connection terminals electrically connected to terminals of the integrated circuit chip, and a first connection portion spaced from the first connection terminals, preparing a second substrate including second connection terminals to be electrically connected to the first connection terminals and a second connection portion spaced from the second connection terminals, providing a metal material portion for bonding on the first connection portion or the second connection portion, and stacking the first substrate and the second substrate by connecting the first connection portion and the second connection portion together via the metal material portion by thermo compression bonding.
申请公布号 US2004238935(A1) 申请公布日期 2004.12.02
申请号 US20040807311 申请日期 2004.03.24
申请人 YOSHIMURA ATSUSHI 发明人 YOSHIMURA ATSUSHI
分类号 H01L25/18;H01L21/98;H01L23/498;H01L25/065;H01L25/10;H01L25/11;(IPC1-7):H01L23/02 主分类号 H01L25/18
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