发明名称 Manufacturing method and structure of copper lines for a liquid crystal panel
摘要 In those conventional arts, for large-size LCD, the process of copper damascene interconnect has some problems of forming a uneven copper seed layer and forming hollows during electrical plating due to the electrical plating area being too large to electroplate uniformly. In this invention, it employs a Cu tape to directly stick on a substrate to replace forming a copper seed layer and electroplating. Hence, the invention avoids the problem of unevenness and hollows in those conventional arts and so the Cu lines can be applied to the large-size LCD.
申请公布号 US2004242112(A1) 申请公布日期 2004.12.02
申请号 US20030449366 申请日期 2003.05.29
申请人 YU-CHOU LEE 发明人 YU-CHOU LEE
分类号 G02F1/1362;H01L21/768;(IPC1-7):H01J9/00 主分类号 G02F1/1362
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