BATCH-TYPE SEMICONDUCTOR FABRICATING APPARATUS TO DEPOSIT THIN FILM OF GOOD QUALITY

摘要

PURPOSE: A batch-type semiconductor fabricating apparatus is provided to deposit a thin film of a good quality and improve a process speed by guaranteeing an optimum process condition, and to solve problems of a shower head by installing an injector in the wall of a chamber so that the portion of the injector exposed to the chamber is reduced. CONSTITUTION: A plurality of semiconductor substrates(3) are received in a chamber(1). A gas supply(2a,2b) source supplies gas to the inside of the chamber. The plurality of semiconductor substrates are supported by a semiconductor substrate supporting part(4). A plurality of injectors(5) inject gas to the semiconductor substrate, supported by the wall of the chamber. The gas supply source is connected to the injector by a plurality of gas supply lines(6). At least one injector is correspondingly installed in each semiconductor substrate.